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Chemical vapor deposition (CVD) is a powerful technique for synthesizing monolayer materials such as transition metal dichalcogenides. It has advantages over exfoliation techniques, including higher purity and the ability to control the chemistry of the products. However, controllable and reproducible synthesis of 2D materials using CVD is a challenge because of the complex growth process and its sensitivity to subtle changes in growth conditions, making it difficult to extend conclusions obtained in one CVD chamber to another. Here, we developed a multiscale model linking CVD control parameters to the morphology, size, and distribution of synthesized 2D materials. Its capabilities are experimentally validated via the systematic growth of MoS₂. In particular, we coupled the reactor-scale governing heat and mass transport equations with the mesoscale phase-field equations for the growth morphology considering the variation of edge energies with the precursor concentration within the growth chamber. The predicted spatial distributions of 2D islands are statistically analyzed, and experiments are then performed to validate the predicted island morphology and distributions. It is shown that the model can be employed to predict and control the morphology and characteristics of synthesized 2D materials.

Doping is a fundamental requirement for tuning and improving the properties of conventional semiconductors. Recent doping studies including niobium (Nb) doping of molybdenum disulfide (MoS₂) and tungsten (W) doping of molybdenum diselenide (MoSe₂) have suggested that substitutional doping may provide an efficient route to tune the doping type and suppress deep trap levels of 2D materials. To date, the impact of the doping on the structural, electronic, and photonic properties of in situ‐doped monolayers remains unanswered due to challenges including strong film substrate charge transfer, and difficulty achieving doping concentrations greater than 0.3 at%. Here, in situ rhenium (Re) doping of synthetic monolayer MoS₂with ≈1 at% Re is demonstrated. To limit substrate film charge transfer,r‐plane sapphire is used. Electronic measurements demonstrate that 1 at% Re doping achieves nearly degenerate n‐type doping, which agrees with density functional theory calculations. Moreover, low‐temperature photoluminescence indicates a significant quench of the defect‐bound emission when Re is introduced, which is attributed to the MoO bond and sulfur vacancies passivation and reduction in gap states due to the presence of Re. The work presented here demonstrates that Re doping of MoS₂is a promising route toward electronic and photonic engineering of 2D materials.